TY  - JOUR
A1  - Schwalb, Christian H.
A1  - Grimm, Christina
A1  - Baranowski, Markus
A1  - Sachser, Roland
A1  - Porrati, Fabrizio
A1  - Reith, Heiko
A1  - Das, Pintu
A1  - Müller, Jens
A1  - Völklein, Friedemann
A1  - Kaya, Alexander
A1  - Huth, Michael
T1  - A tunable strain sensor using nanogranular metals
T2  - Sensors
N2  - This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the maskless lithography technique of focused electron-beam-induced deposition (FEBID) employing the precursor trimethylmethylcyclopentadienyl platinum [MeCpPt(Me)3]. We use a cantilever-based deflection technique to determine the sensitivity (gauge factor) of the sensor element. We find that its sensitivity depends on the electrical conductivity and can be continuously tuned, either by the thickness of the deposit or by electron-beam irradiation leading to a distinct maximum in the sensitivity. This maximum finds a theoretical rationale in recent advances in the understanding of electronic charge transport in nano-granular metals.
Y1  - 2010
UR  - http://publikationen.ub.uni-frankfurt.de/frontdoor/index/index/docId/24273
UR  - https://nbn-resolving.org/urn:nbn:de:hebis:30:3-242736
SN  - 1424-8220
VL  - 10
IS  - 11
SP  - 9847
EP  - 9856
PB  - MDPI
CY  - Basel
ER  -