TY  - JOUR
A1  - Kämpken, Britta
A1  - Wulf, Verena
A1  - Auner, Norbert
A1  - Winhold, Marcel
A1  - Huth, Michael
A1  - Rhinow, Daniel
A1  - Terfort, Andreas
T1  - Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst
T2  - Beilstein journal of nanotechnology
N2  - In this work the applicability of neopentasilane (Si(SiH3)4) as a precursor for the formation of silicon nanowires by using gold nanoparticles as a catalyst has been explored. The growth proceeds via the formation of liquid gold/silicon alloy droplets, which excrete the silicon nanowires upon continued decomposition of the precursor. This mechanism determines the diameter of the Si nanowires. Different sources for the gold nanoparticles have been tested: the spontaneous dewetting of gold films, thermally annealed gold films, deposition of preformed gold nanoparticles, and the use of “liquid bright gold”, a material historically used for the gilding of porcelain and glass. The latter does not only form gold nanoparticles when deposited as a thin film and thermally annealed, but can also be patterned by using UV irradiation, providing access to laterally structured layers of silicon nanowires.
KW  - chemical vapor deposition
KW  - gold
KW  - nanoparticle
KW  - patterning
KW  - radiation-induced nanostructures
KW  - vapor-liquid-solid mechanism
Y1  - 2012
UR  - http://publikationen.ub.uni-frankfurt.de/frontdoor/index/index/docId/26318
UR  - https://nbn-resolving.org/urn:nbn:de:hebis:30:3-263182
SN  - 2190-4286
VL  - 3
SP  - 535
EP  - 545
PB  - Beilstein-Institut zur Förderung der Chemischen Wissenschaften
CY  - Frankfurt, M.
ER  -