TY  - JOUR
A1  - Muthukumar, Kaliappan
A1  - Jeschke, Harald O.
A1  - Valentí, Roser
A1  - Begun, Evgeniya
A1  - Schwenk, Johannes
A1  - Porrati, Fabrizio
A1  - Huth, Michael
T1  - Spontaneous dissociation of Co2(CO)8 and autocatalytic growth of Co on SiO2: A combined experimental and theoretical investigation
T2  - Beilstein journal of nanotechnology
N2  - We present experimental results and theoretical simulations of the adsorption behavior of the metal–organic precursor Co2(CO)8 on SiO2 surfaces after application of two different pretreatment steps, namely by air plasma cleaning or a focused electron beam pre-irradiation. We observe a spontaneous dissociation of the precursor molecules as well as autodeposition of cobalt on the pretreated SiO2 surfaces. We also find that the differences in metal content and relative stability of these deposits depend on the pretreatment conditions of the substrate. Transport measurements of these deposits are also presented. We are led to assume that the degree of passivation of the SiO2 surface by hydroxyl groups is an important controlling factor in the dissociation process. Our calculations of various slab settings, using dispersion-corrected density functional theory, support this assumption. We observe physisorption of the precursor molecule on a fully hydroxylated SiO2 surface (untreated surface) and chemisorption on a partially hydroxylated SiO2 surface (pretreated surface) with a spontaneous dissociation of the precursor molecule. In view of these calculations, we discuss the origin of this dissociation and the subsequent autocatalysis.
KW  - Co2(CO)8
KW  - deposition
KW  - dissociation
KW  - EBID
KW  - FEBID
KW  - precursor
KW  - radiation-induced nanostructures
Y1  - 2012
UR  - http://publikationen.ub.uni-frankfurt.de/frontdoor/index/index/docId/27777
UR  - https://nbn-resolving.org/urn:nbn:de:hebis:30:3-277774
SN  - 2190-4286
N1  - This is an Open Access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/2.0), which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
VL  - 3
SP  - 546
EP  - 555
PB  - Beilstein-Institut zur Förderung der Chemischen Wissenschaften
CY  - Frankfurt, M.
ER  -