A tunable strain sensor using nanogranular metals

This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the m
This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the maskless lithography technique of focused electron-beam-induced deposition (FEBID) employing the precursor trimethylmethylcyclopentadienyl platinum [MeCpPt(Me)3]. We use a cantilever-based deflection technique to determine the sensitivity (gauge factor) of the sensor element. We find that its sensitivity depends on the electrical conductivity and can be continuously tuned, either by the thickness of the deposit or by electron-beam irradiation leading to a distinct maximum in the sensitivity. This maximum finds a theoretical rationale in recent advances in the understanding of electronic charge transport in nano-granular metals.
show moreshow less

Download full text files

Export metadata

  • Export Bibtex
  • Export RIS

Additional Services

    Share in Twitter Search Google Scholar
Metadaten
Author:Christian H. Schwalb, Christina Grimm, Markus Baranowski, Roland Sachser, Fabrizio Porrati, Heiko Reith, Pintu Das, Jens Müller, Friedemann Völklein, Alexander Kaya, Michael Huth
URN:urn:nbn:de:hebis:30:3-242736
DOI:http://dx.doi.org/doi:10.3390/s101109847
ISSN:1424-8220
Parent Title (English):Sensors
Publisher:MDPI
Place of publication:Basel
Document Type:Article
Language:English
Date of Publication (online):2010/11/02
Date of first Publication:2010/11/02
Publishing Institution:Univ.-Bibliothek Frankfurt am Main
Release Date:2012/06/13
Psyndex Keyword:cantilevers; electron beam induced deposition; granular metals; strain sensors
Volume:10
Issue:11
Pagenumber:10
First Page:9847
Last Page:9856
HeBIS PPN:303611480
Institutes:Physik
Dewey Decimal Classification:670 Industrielle Fertigung
Sammlungen:Universitätspublikationen
Licence (German):License LogoCreative Commons - Namensnennung 3.0

$Rev: 11761 $