Temperature-dependent growth characteristics of nb- and cofe-based nanostructures by direct-write using focused electron beam-induced deposition

  • Focused electron and ion beam-induced deposition (FEBID/FIBID) are direct-write techniques with particular advantages in three-dimensional (3D) fabrication of ferromagnetic or superconducting nanostructures. Recently, two novel precursors, HCo 3 Fe(CO) 12 and Nb(NMe 3 ) 2 (N-t-Bu), were introduced, resulting in fully metallic CoFe ferromagnetic alloys by FEBID and superconducting NbC by FIBID, respectively. In order to properly define the writing strategy for the fabrication of 3D structures using these precursors, their temperature-dependent average residence time on the substrate and growing deposit needs to be known. This is a prerequisite for employing the simulation-guided 3D computer aided design (CAD) approach to FEBID/FIBID, which was introduced recently. We fabricated a series of rectangular-shaped deposits by FEBID at different substrate temperatures between 5 ∘ C and 24 ∘ C using the precursors and extracted the activation energy for precursor desorption and the pre-exponential factor from the measured heights of the deposits using the continuum growth model of FEBID based on the reaction-diffusion equation for the adsorbed precursor.

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Author:Michael HuthORCiDGND, Fabrizio PorratiORCiD, Peter Gruszka, Sven BarthORCiDGND
URN:urn:nbn:de:hebis:30:3-527649
DOI:https://doi.org/10.3390/mi11010028
ISSN:2072-666X
Pubmed Id:https://pubmed.ncbi.nlm.nih.gov/31881650
Parent Title (English):Micromachines
Publisher:MDPI
Place of publication:Basel
Document Type:Article
Language:English
Year of Completion:2019
Date of first Publication:2019/12/25
Publishing Institution:Universitätsbibliothek Johann Christian Senckenberg
Release Date:2020/01/27
Tag:continuum model; focused electron beam induced deposition; precursor residence time
Volume:11
Issue:1, Art. 28
Page Number:9
First Page:1
Last Page:9
Note:
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited
HeBIS-PPN:459848267
Institutes:Physik / Physik
Dewey Decimal Classification:5 Naturwissenschaften und Mathematik / 53 Physik / 530 Physik
Sammlungen:Universitätspublikationen
Open-Access-Publikationsfonds:Physik
Licence (German):License LogoCreative Commons - Namensnennung 4.0